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@ARTICLE{Hahn:139335,
author = {Hahn, Herwig and Reuters, B. and Pooth, Alexander and
Holländer, Bernhard and Heuken, Michael and Kalisch, Holger
and Vescan, Andrei},
title = {p-{C}hannel {E}nhancement and {D}epletion {M}ode
{G}a{N}-{B}ased {HFET}s {W}ith {Q}uaternary {B}ackbarriers},
journal = {IEEE transactions on electron devices},
volume = {60},
number = {10},
issn = {1557-9646},
address = {New York, NY},
publisher = {IEEE},
reportid = {FZJ-2013-05332},
pages = {3005 - 3011},
year = {2013},
abstract = {Within the last years, III-nitride-based devices have been
demonstrated with exceptional performance. There is,
however, a severe lack of knowledge when it comes
fabrication of p-channel devices. p-Channel heterostructure
field-effect transistors (HFETs) could open the way for
nitride-based complementary logic. Here, a comprehensive
study of enhancement and depletion mode p-channel
GaN/AlInGaN HFETs is performed. The influence of a highly
p-doped GaN cap layer on device performance is investigated.
Gate recessing and changes in composition of the backbarrier
are analyzed. ON/OFF ratios of up to 108 and subthreshold
swings of about 75 mV/decade are achieved.},
cin = {PGI-9},
ddc = {620},
cid = {I:(DE-Juel1)PGI-9-20110106},
pnm = {421 - Frontiers of charge based Electronics (POF2-421)},
pid = {G:(DE-HGF)POF2-421},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000324928900005},
doi = {10.1109/TED.2013.2272330},
url = {https://juser.fz-juelich.de/record/139335},
}