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@ARTICLE{Zhang:139338,
      author       = {Zhang, B. and Yu, W. and Zhao, Q. T. and Buca, D. and
                      Breuer, Uwe and Hartmann, J. -M. and Holländer, B. and
                      Mantl, S. and Zhang, M. and Wang, X.},
      title        = {{E}ffects of {C}+ ion implantation on electrical properties
                      of {N}i{S}i{G}e/{S}i{G}e contacts},
      journal      = {Nuclear instruments $\&$ methods in physics research / B},
      volume       = {307},
      issn         = {0168-583X},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier},
      reportid     = {FZJ-2013-05335},
      pages        = {408 - 411},
      year         = {2013},
      abstract     = {We have investigated the morphology and electrical
                      properties of NiSiGe/SiGe contact by C+ ions pre-implanted
                      into relaxed Si0.8Ge0.2 layers. Cross-section transmission
                      electron microscopy revealed that both the surface and
                      interface of NiSiGe were improved by C+ ions implantation.
                      In addition, the effective hole Schottky barrier heights
                      (ΦBp) of NiSiGe/SiGe were extracted. ΦBp was observed to
                      decrease substantially with an increase in C+ ion
                      implantation dose.},
      cin          = {PGI-9 / ZEA-3 / ICS-3},
      ddc          = {530},
      cid          = {I:(DE-Juel1)PGI-9-20110106 / I:(DE-Juel1)ZEA-3-20090406 /
                      I:(DE-Juel1)ICS-3-20110106},
      pnm          = {421 - Frontiers of charge based Electronics (POF2-421)},
      pid          = {G:(DE-HGF)POF2-421},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000321722200091},
      doi          = {10.1016/j.nimb.2012.11.088},
      url          = {https://juser.fz-juelich.de/record/139338},
}