%0 Conference Paper
%A Nichau, Alexander
%A Schäfer, Anna
%A Knoll, Lars
%A Wirths, Stephan
%A Schram, T.
%A Ragnarsson, L. -A.
%A Schubert, Jürgen
%A Bernardy, Patric
%A Luysberg, Martina
%A Besmehn, Astrid
%A Breuer, Uwe
%A Buca, Dan Mihai
%A Mantl, Siegfried
%T Reduction of silicon dioxide interfacial layer to 4.6 A EOT by Al remote scavenging in high-k/metal gate stacks on Si
%I RWTH Aachen
%M FZJ-2013-05613
%D 2013
%B 18th Conference on 'Insulating Films on Semiconductors'
%C 25 Jun 2013 - 28 Jun 2013, Krakau (Polen)
Y2 25 Jun 2013 - 28 Jun 2013
M2 Krakau, Polen
%F PUB:(DE-HGF)6
%9 Conference Presentation
%U https://juser.fz-juelich.de/record/139635