TY  - CONF
AU  - Nichau, Alexander
AU  - Schäfer, Anna
AU  - Knoll, Lars
AU  - Wirths, Stephan
AU  - Schram, T.
AU  - Ragnarsson, L. -A.
AU  - Schubert, Jürgen
AU  - Bernardy, Patric
AU  - Luysberg, Martina
AU  - Besmehn, Astrid
AU  - Breuer, Uwe
AU  - Buca, Dan Mihai
AU  - Mantl, Siegfried
TI  - Reduction of silicon dioxide interfacial layer to 4.6 A EOT by Al remote scavenging in high-k/metal gate stacks on Si
PB  - RWTH Aachen
M1  - FZJ-2013-05613
PY  - 2013
T2  - 18th Conference on 'Insulating Films on Semiconductors'
CY  - 25 Jun 2013 - 28 Jun 2013, Krakau (Polen)
Y2  - 25 Jun 2013 - 28 Jun 2013
M2  - Krakau, Polen
LB  - PUB:(DE-HGF)6
UR  - https://juser.fz-juelich.de/record/139635
ER  -