Home > Publications database > Reduction of silicon dioxide interfacial layer to 4.6 A EOT by Al remote scavenging in high-k/metal gate stacks on Si > print

001     139635
005     20240610120001.0
037 _ _ |a FZJ-2013-05613
041 _ _ |a English
100 1 _ |a Nichau, Alexander
|0 P:(DE-Juel1)128618
|b 0
|u fzj
|e Corresponding author
111 2 _ |a 18th Conference on 'Insulating Films on Semiconductors'
|w Polen
|c Krakau
|d 2013-06-25 - 2013-06-28
|g INFOS2013
245 _ _ |a Reduction of silicon dioxide interfacial layer to 4.6 A EOT by Al remote scavenging in high-k/metal gate stacks on Si
260 _ _ |c 2013
336 7 _ |a Conference Presentation
|b conf
|m conf
|0 PUB:(DE-HGF)6
|s 1385632971_8169
|2 PUB:(DE-HGF)
|x Other
336 7 _ |a Conference Paper
|0 33
|2 EndNote
336 7 _ |a Other
|2 DataCite
336 7 _ |a LECTURE_SPEECH
|2 ORCID
336 7 _ |a conferenceObject
|2 DRIVER
336 7 _ |a INPROCEEDINGS
|2 BibTeX
502 _ _ |c RWTH Aachen
536 _ _ |a 421 - Frontiers of charge based Electronics (POF2-421)
|0 G:(DE-HGF)POF2-421
|c POF2-421
|x 0
|f POF II
700 1 _ |a Schäfer, Anna
|0 P:(DE-Juel1)144017
|b 1
|u fzj
700 1 _ |a Knoll, Lars
|0 P:(DE-Juel1)162211
|b 2
|u fzj
700 1 _ |a Wirths, Stephan
|0 P:(DE-Juel1)138778
|b 3
|u fzj
700 1 _ |a Schram, T.
|0 P:(DE-HGF)0
|b 4
700 1 _ |a Ragnarsson, L. -A.
|0 P:(DE-HGF)0
|b 5
700 1 _ |a Schubert, Jürgen
|0 P:(DE-Juel1)128631
|b 6
|u fzj
700 1 _ |a Bernardy, Patric
|0 P:(DE-Juel1)138772
|b 7
|u fzj
700 1 _ |a Luysberg, Martina
|0 P:(DE-Juel1)130811
|b 8
|u fzj
700 1 _ |a Besmehn, Astrid
|0 P:(DE-Juel1)133839
|b 9
|u fzj
700 1 _ |a Breuer, Uwe
|0 P:(DE-Juel1)133840
|b 10
|u fzj
700 1 _ |a Buca, Dan Mihai
|0 P:(DE-Juel1)125569
|b 11
|u fzj
700 1 _ |a Mantl, Siegfried
|0 P:(DE-Juel1)128609
|b 12
|u fzj
909 C O |o oai:juser.fz-juelich.de:139635
|p VDB
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)128618
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 1
|6 P:(DE-Juel1)144017
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 2
|6 P:(DE-Juel1)162211
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 3
|6 P:(DE-Juel1)138778
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 6
|6 P:(DE-Juel1)128631
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 7
|6 P:(DE-Juel1)138772
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 8
|6 P:(DE-Juel1)130811
910 1 _ |a Analytik
|0 I:(DE-Juel1)ZEA-3-20090406
|k ZEA-3
|b 9
|6 P:(DE-Juel1)133839
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 9
|6 P:(DE-Juel1)133839
910 1 _ |a Analytik
|0 I:(DE-Juel1)ZEA-3-20090406
|k ZEA-3
|b 10
|6 P:(DE-Juel1)133840
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 10
|6 P:(DE-Juel1)133840
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 11
|6 P:(DE-Juel1)125569
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 12
|6 P:(DE-Juel1)128609
913 1 _ |a DE-HGF
|b Schlüsseltechnologien
|1 G:(DE-HGF)POF2-420
|0 G:(DE-HGF)POF2-421
|2 G:(DE-HGF)POF2-400
|v Frontiers of charge based Electronics
|x 0
|4 G:(DE-HGF)POF
|3 G:(DE-HGF)POF2
|l Grundlagen zukünftiger Informationstechnologien
914 1 _ |y 2013
920 _ _ |l yes
920 1 _ |0 I:(DE-Juel1)PGI-9-20110106
|k PGI-9
|l Halbleiter-Nanoelektronik
|x 0
920 1 _ |0 I:(DE-82)080009_20140620
|k JARA-FIT
|l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology
|x 1
920 1 _ |0 I:(DE-Juel1)ZEA-3-20090406
|k ZEA-3
|l Analytik
|x 2
920 1 _ |0 I:(DE-Juel1)PGI-5-20110106
|k PGI-5
|l Mikrostrukturforschung
|x 3
980 _ _ |a conf
980 _ _ |a VDB
980 _ _ |a UNRESTRICTED
980 _ _ |a I:(DE-Juel1)PGI-9-20110106
980 _ _ |a I:(DE-Juel1)VDB881
980 _ _ |a I:(DE-Juel1)ZEA-3-20090406
980 _ _ |a I:(DE-Juel1)PGI-5-20110106
981 _ _ |a I:(DE-Juel1)ER-C-1-20170209
981 _ _ |a I:(DE-Juel1)VDB881
981 _ _ |a I:(DE-Juel1)ZEA-3-20090406
981 _ _ |a I:(DE-Juel1)PGI-5-20110106

LibraryCollectionCLSMajorCLSMinorLanguageAuthor
Marc 21