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000150595 0247_ $$2doi$$a10.1016/j.electacta.2013.08.092
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000150595 1001_ $$0P:(DE-Juel1)161164$$aIken, H.$$b0$$eCorresponding author$$ufzj
000150595 245__ $$aDevelopment of redox glasses and subsequent processing by means of pulsed laser deposition for realizing silicon-based thin-film sensors.
000150595 260__ $$aNew York, NY [u.a.]$$bElsevier$$c2013
000150595 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1391062416_27212
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000150595 520__ $$aIn this work, two different redox-sensitive glass materials have been fabricated for the development of a production friendly redox electrode. The specific glass targets have been prepared by glass pouring process. The transducer structure is fabricated via conventional silicon-based semiconductor technology. The glass bulk material was deposited for the first time by means of pulsed laser deposition process into the thin-film state on the sensor structures. The fabricated sensors have been physically and electrochemically characterized by X-ray photoelectron spectroscopy, determination of expansion coefficient, impedance and potentiometric measurements.
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000150595 7001_ $$0P:(DE-HGF)0$$aAhlborn, K.$$b1
000150595 7001_ $$0P:(DE-HGF)0$$aGerlach, F.$$b2
000150595 7001_ $$0P:(DE-HGF)0$$aVonau, W.$$b3
000150595 7001_ $$0P:(DE-Juel1)128648$$aZander, W.$$b4$$ufzj
000150595 7001_ $$0P:(DE-Juel1)128631$$aSchubert, J.$$b5$$ufzj
000150595 7001_ $$0P:(DE-Juel1)128727$$aSchöning, M. J.$$b6$$ufzj
000150595 773__ $$0PERI:(DE-600)1483548-4$$a10.1016/j.electacta.2013.08.092$$gVol. 113, p. 762 - 767$$p762 - 767$$tElectrochimica acta$$v113$$x0013-4686$$y2013
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