Book/Dissertation / PhD Thesis

FZJ-2014-01879

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Electrical characterization of manganite and titanate heterostructures

Herpers, A. (Corresponding Author)FZJ*

2014
Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag Jülich
ISBN: 978-3-89336-948-5

This record in other databases:

Please use a persistent id in citations: http://hdl.handle.net/2128/18551

Abstract: As the current memory technology will reach its physical limit within the next decades, innovative concepts have to be developed to ensure future improvements in size, power consumption and costs in data storage. A promising candidate among "Beyond CMOS" technologies is resistive RAM, which is based on the non-volatile and reversible switching of the resistance of a device with the help of an external stimulus. More specific, fast writing and reading operations in resistively switching transition metal oxides seem to be enabled by redox-based mechanisms, which usually go along with the formation of a conducting filament to bridge the insulating matrix. For a few materials, the switching occurs homogeneously over the entire device area, which offers one more degree of freedom in device design. For this switching type, the interface effects between the involved resistively switching oxide and the active electrode play the key role. The main topic of this work is this redox-based interplay between the oxidizable electrode material and a complex oxide in a homogeneously switching ReRAM device, realized for the quaternary transition metal oxide (Pr,Ca)MnO$_{3 \pm \delta}$ as epitaxial model system. In order to obtain high quality epitaxial thin films by pulsed laser deposition, detailed growth studies were performed. In spite of the rather high lattice mismatch of -2.39% to the SrTiO$_{3}$ substrate, defect-poor (Pr,Ca)MnO$_{3 \pm \delta}$ could be successfully grown in various layer stacks. For film thicknesses larger than 40 nm, the elastic strain energy becomes sufficient high for relaxation effects. We identified two concurring processes for relaxation, crack formation and the incorporation of edge dislocations, which result in crucially different structural and electrical properties of the (Pr,Ca)MnO$_{3 \pm \delta}$ thin film. After an initial electroforming step, (Pr,Ca)MnO$_{3 \pm \delta}$ with Ti as active top electrode exhibits stable resistive switching properties, for which we could obtain a resistance ratio of one order of magnitude and retention times of at least 300 days. A redox reaction was found to occur at the interface involving an oxygen transfer from the (Pr,Ca)MnO$_{3 \pm \delta}$ to theTi. A change of the valence state on the Ti-side was identified during the forming and also the switching processes by X-ray spectroscopy. The current transport in the devices could be described by a polaron hopping contribution and a serial ohmic resistor for the symmetric low resistive states, and with the presence of a trapezoidal tunnel barrier for the high resistive states. Combining both results, a coherent model was derived to explain the switching effect in (Pr,Ca)MnO$_{3 \pm \delta}$/Ti devices by the formation and bridging of a TiO$_{2}$ tunnel barrier, naturally formed at the (Pr,Ca)MnO$_{3 \pm \delta}$/Ti interface.

Keyword(s): Dissertation

Note: RWTH Aachen, Diss., 2014

---

Contributing Institute(s):

1. Elektronische Materialien (PGI-7)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2014

---

Database coverage:

---