%0 Journal Article
%A Hoppe, Michael
%A Gorgoii, Mihaela
%A Schneider, Claus Michael
%A Müller, Martina
%T Wide-range Structural and Chemical Stability of the Magnetic Oxide NiFe2O4 Grown by O2-assisted Pulsed Laser Deposition
%J IEEE transactions on magnetics
%V 50
%N 11
%@ 1941-0069
%C New York, NY
%I IEEE
%M FZJ-2014-03183
%P 1-4
%D 2014
%X We present a study of the structural and chemical properties of the magnetic insulator NiFe2O4 on conductive Nb-dopedSrTiO3(001) substrates. Special regard is given to the dependence of the thin film properties on the O2:Ar ratio during pulsed laserdeposition. By using stoichiometric NiFe2O4 target material and varying the O2 partial pressure from 0% to 100%, we find a nonzerooxygen threshold for heteroepitaxial growth and a stoichiometric Fe:Ni cation distribution. Moreover, our study clearly demonstratesthat NiFe2O4 thin films grow with high quality over a wide range of oxygen partial pressures. These optimized NiFe2O4/SrTiO3heterostructures are envisioned as efficient spin filter tunnel contacts for room temperature application.
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000349465900144
%R 10.1109/TMAG.2014.2322378
%U https://juser.fz-juelich.de/record/153679