Journal Article

FZJ-2014-03183

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Wide-range Structural and Chemical Stability of the Magnetic Oxide NiFe2O4 Grown by O2-assisted Pulsed Laser Deposition

Hoppe, M. (Corresponding Author)FZJ* ; Gorgoii, M. ; Schneider, C. M.FZJ* ; Müller, M.FZJ*

2014
IEEE New York, NY

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Please use a persistent id in citations: doi:10.1109/TMAG.2014.2322378

Abstract: We present a study of the structural and chemical properties of the magnetic insulator NiFe2O4 on conductive Nb-dopedSrTiO3(001) substrates. Special regard is given to the dependence of the thin film properties on the O2:Ar ratio during pulsed laserdeposition. By using stoichiometric NiFe2O4 target material and varying the O2 partial pressure from 0% to 100%, we find a nonzerooxygen threshold for heteroepitaxial growth and a stoichiometric Fe:Ni cation distribution. Moreover, our study clearly demonstratesthat NiFe2O4 thin films grow with high quality over a wide range of oxygen partial pressures. These optimized NiFe2O4/SrTiO3heterostructures are envisioned as efficient spin filter tunnel contacts for room temperature application.

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Contributing Institute(s):

1. Elektronische Eigenschaften (PGI-6)

Research Program(s):

1. 422 - Spin-based and quantum information (POF2-422) (POF2-422)

Appears in the scientific report 2014

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Database coverage:
; JCR ; SCOPUS ; Science Citation Index ; Science Citation Index Expanded ; Thomson Reuters Master Journal List ; Web of Science Core Collection ; Zoological Record

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