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000153679 1001_ $$0P:(DE-Juel1)136688$$aHoppe, Michael$$b0$$eCorresponding Author$$ufzj
000153679 245__ $$aWide-range Structural and Chemical Stability of the Magnetic Oxide NiFe2O4 Grown by O2-assisted Pulsed Laser Deposition
000153679 260__ $$aNew York, NY$$bIEEE$$c2014
000153679 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1420461182_23895
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000153679 520__ $$aWe present a study of the structural and chemical properties of the magnetic insulator NiFe2O4 on conductive Nb-dopedSrTiO3(001) substrates. Special regard is given to the dependence of the thin film properties on the O2:Ar ratio during pulsed laserdeposition. By using stoichiometric NiFe2O4 target material and varying the O2 partial pressure from 0% to 100%, we find a nonzerooxygen threshold for heteroepitaxial growth and a stoichiometric Fe:Ni cation distribution. Moreover, our study clearly demonstratesthat NiFe2O4 thin films grow with high quality over a wide range of oxygen partial pressures. These optimized NiFe2O4/SrTiO3heterostructures are envisioned as efficient spin filter tunnel contacts for room temperature application.
000153679 536__ $$0G:(DE-HGF)POF2-422$$a422 - Spin-based and quantum information (POF2-422)$$cPOF2-422$$fPOF II$$x0
000153679 7001_ $$0P:(DE-HGF)0$$aGorgoii, Mihaela$$b1
000153679 7001_ $$0P:(DE-Juel1)130948$$aSchneider, Claus Michael$$b2$$ufzj
000153679 7001_ $$0P:(DE-Juel1)130854$$aMüller, Martina$$b3$$ufzj
000153679 773__ $$0PERI:(DE-600)2025397-7$$a10.1109/TMAG.2014.2322378$$n11$$p1-4$$tIEEE transactions on magnetics$$v50$$x1941-0069$$y2014
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000153679 9132_ $$0G:(DE-HGF)POF3-522$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Spin-Based Phenomena$$x0
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000153679 9141_ $$y2014
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