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000155285 1001_ $$0P:(DE-Juel1)140489$$aAslam, N.$$b0$$eCorresponding Author$$ufzj
000155285 245__ $$aImpact of composition and crystallization behavior of atomic layer deposited strontium titanate films on the resistive switching of Pt/STO/TiN devices
000155285 260__ $$aMelville, NY$$bAmerican Institute of Physics$$c2014
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000155285 520__ $$aThe resistive switching (RS) properties of strontium titanate (Sr1+xTi1+yO3+(x+2y), STO) based metal-oxide-metal structures prepared from industrial compatible processes have been investigated focusing on the effects of composition, microstructure, and device size. Metastable perovskite STO films were prepared on Pt-coated Si substrates utilizing plasma-assisted atomic layer deposition (ALD) from cyclopentadienyl-based metal precursors and oxygen plasma at 350 °C, and a subsequent annealing at 600 °C in nitrogen. Films of 15 nm and 12 nm thickness with three different compositions [Sr]/([Sr] + [Ti]) of 0.57 (Sr-rich STO), 0.50 (stoichiometric STO), and 0.46 (Ti-rich STO) were integrated into Pt/STO/TiN crossbar structures with sizes ranging from 100 μm2 to 0.01 μm2. Nano-structural characterizations revealed a clear effect of the composition of the as-deposited STO films on their crystallization behavior and thus on the final microstructures. Local current maps obtained by local-conductivity atomic force microscopy were in good agreement with local changes of the films' microstructures. Correspondingly, also the initial leakage currents of the Pt/STO/TiN devices were affected by the STO compositions and by the films' microstructures. An electroforming process set the Pt/STO/TiN devices into the ON-state, while the forming voltage decreased with increasing initial leakage current. After a RESET process under opposite voltage has been performed, the Pt/STO/TiN devices showed a stable bipolar RS behavior with non-linear current-voltage characteristics for the high (HRS) and the low (LRS) resistance states. The obtained switching polarity and nearly area independent LRS values agree with a filamentary character of the RS behavior according to the valence change mechanism. The devices of 0.01 μm2 size with a 12 nm polycrystalline stoichiometric STO film were switched at a current compliance of 50 μA with voltages of about ±1.0 V between resistance states of about 40 kΩ (LRS) and 1 MΩ (HRS). After identification of the influences of the films' microstructures, i.e., grain boundaries and small cracks, the remaining RS properties could be ascribed to the effect of the [Sr]/([Sr] + [Ti]) composition of the ALD STO thin films.
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000155285 7001_ $$0P:(DE-HGF)0$$aLongo, V.$$b1
000155285 7001_ $$0P:(DE-Juel1)142194$$aRodenbücher, C.$$b2$$ufzj
000155285 7001_ $$0P:(DE-HGF)0$$aRoozeboom, F.$$b3
000155285 7001_ $$0P:(DE-HGF)0$$aKessels, W. M. M.$$b4
000155285 7001_ $$0P:(DE-Juel1)130993$$aSzot, K.$$b5$$ufzj
000155285 7001_ $$0P:(DE-Juel1)131022$$aWaser, R.$$b6$$ufzj
000155285 7001_ $$0P:(DE-Juel1)130717$$aHoffmann-Eifert, S.$$b7$$ufzj
000155285 773__ $$0PERI:(DE-600)1476463-5$$a10.1063/1.4891831$$gVol. 116, no. 6, p. 064503 -$$n6$$p064503 -$$tJournal of applied physics$$v116$$x1089-7550$$y2014
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000155285 8767_ $$92014-08-20$$d2014-08-21$$ePublication charges$$jZahlung erfolgt
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