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20nm gate length Schottky MOSFETs with ultra thin NiSi/epitaxial NiSi2 source/drain
Knoll, L.FZJ* ; Zhao, Q. T.FZJ* ; Luptak, R.FZJ* ; Trellenkamp, S.FZJ* ; Bourdelle, K. K. ; Mantl, S.FZJ*
2011
201112 International Conference on Ultimate Integration on Silicon (ULIS)
Seminar, Cork, IrelandCork, Ireland, 14 Mar 20112011-03-14
Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
- Halbleiter-Nanoelektronik (PGI-9)
- Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
- Bioelektronik (PGI-8)
Research Program(s):
- Grundlagen für zukünftige Informationstechnologien (P42)
Appears in the scientific report
2011