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@ARTICLE{Lehmann:15907,
      author       = {Lehmann, J. and Shevchenko, N. and Mücklich, A. and
                      Borany, J.V. and Skorupa, W. and Schubert, J. and Lopes,
                      J.M.J. and Mantl, S.},
      title        = {{M}illisecond flash-lamp annealing of {L}a{L}u{O}3},
      journal      = {Microelectronic engineering},
      volume       = {88},
      issn         = {0167-9317},
      address      = {[S.l.] @},
      publisher    = {Elsevier},
      reportid     = {PreJuSER-15907},
      pages        = {1346 - 1348},
      year         = {2011},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Metal-oxide-semiconductor capacitors containing the
                      alternative high-k dielectric LaLuO3 were treated by flash
                      lamp annealing (FLA). Capacitance-voltage (C-V) and
                      current-voltage (J-V) characteristics reveal an increase in
                      the capacitance for the flashed samples while the very low
                      leakage current of the LaLuO3 is retained. Microstructural
                      investigations confirm the thermal stability of the film
                      even after FLA at 1200 degrees C, 20 ms. (C) 2011 Published
                      by Elsevier B.V.},
      keywords     = {J (WoSType)},
      cin          = {PGI-9},
      ddc          = {620},
      cid          = {I:(DE-Juel1)PGI-9-20110106},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      shelfmark    = {Engineering, Electrical $\&$ Electronic / Nanoscience $\&$
                      Nanotechnology / Optics / Physics, Applied},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000292572700077},
      doi          = {10.1016/j.mee.2011.03.126},
      url          = {https://juser.fz-juelich.de/record/15907},
}