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@ARTICLE{Smirnov:171993,
author = {Smirnov, V. and Lambertz, A. and Tillmanns, S. and Finger,
F.},
title = {p- and n-type microcrystalline silicon oxide (μc-{S}i{O}
$_{x}$ :{H}) for applications in thin film silicon tandem
solar cells 1},
journal = {Canadian journal of physics},
volume = {92},
number = {7/8},
issn = {1208-6045},
address = {Ottawa, Ontario},
publisher = {NRC Research Press},
reportid = {FZJ-2014-05547},
pages = {932 - 935},
year = {2014},
abstract = {We report on the development and application of p- and
n-type hydrogenated microcrystalline silicon oxide
(μc-SiOx:H) alloys in tandem thin film silicon solar cells.
Our results show that the optical, electrical, and
structural properties of μc-SiOx:H can be conveniently
tuned over a wide range to fulfil the requirements for solar
cell applications. We have shown that adding of PH3 gas
during deposition tends to increase crystallinity of
μc-SiOx:H layers, while additional trimethylboron (TMB)
tends to suppress crystalline growth. When applied in tandem
solar cells, both p- and n-type μc-SiOx:H lead to a
remarkable increase in the top cell current. Taking
advantage of low refractive index and high optical band gap
of μc-SiOx:H allows the achievement of high efficiencies of
$13.1\%$ (initial) and $11.8\%$ (stabilized)},
cin = {IEK-5},
ddc = {530},
cid = {I:(DE-Juel1)IEK-5-20101013},
pnm = {111 - Thin Film Photovoltaics (POF2-111)},
pid = {G:(DE-HGF)POF2-111},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000339379500084},
doi = {10.1139/cjp-2013-0640},
url = {https://juser.fz-juelich.de/record/171993},
}