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| Home > Publications database > p- and n-type microcrystalline silicon oxide (μc-SiO $_{x}$ :H) for applications in thin film silicon tandem solar cells 1 |
| Home > Publications database > p- and n-type microcrystalline silicon oxide (μc-SiO $_{x}$ :H) for applications in thin film silicon tandem solar cells 1 |
| Journal Article | FZJ-2014-05547 |
; ; ;
2014
NRC Research Press
Ottawa, Ontario
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Please use a persistent id in citations: doi:10.1139/cjp-2013-0640
Abstract: We report on the development and application of p- and n-type hydrogenated microcrystalline silicon oxide (μc-SiOx:H) alloys in tandem thin film silicon solar cells. Our results show that the optical, electrical, and structural properties of μc-SiOx:H can be conveniently tuned over a wide range to fulfil the requirements for solar cell applications. We have shown that adding of PH3 gas during deposition tends to increase crystallinity of μc-SiOx:H layers, while additional trimethylboron (TMB) tends to suppress crystalline growth. When applied in tandem solar cells, both p- and n-type μc-SiOx:H lead to a remarkable increase in the top cell current. Taking advantage of low refractive index and high optical band gap of μc-SiOx:H allows the achievement of high efficiencies of 13.1% (initial) and 11.8% (stabilized)
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