Home > Publications database > p- and n-type microcrystalline silicon oxide (μc-SiO $_{x}$ :H) for applications in thin film silicon tandem solar cells 1 > print

001     171993
005     20240708133746.0
024 7 _ |a 10.1139/cjp-2013-0640
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024 7 _ |a 0008-4204
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024 7 _ |a 1208-6045
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037 _ _ |a FZJ-2014-05547
082 _ _ |a 530
100 1 _ |a Smirnov, V.
|0 P:(DE-Juel1)130297
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|e Corresponding Author
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245 _ _ |a p- and n-type microcrystalline silicon oxide (μc-SiO $_{x}$ :H) for applications in thin film silicon tandem solar cells 1
260 _ _ |a Ottawa, Ontario
|c 2014
|b NRC Research Press
336 7 _ |a Journal Article
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336 7 _ |a article
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520 _ _ |a We report on the development and application of p- and n-type hydrogenated microcrystalline silicon oxide (μc-SiOx:H) alloys in tandem thin film silicon solar cells. Our results show that the optical, electrical, and structural properties of μc-SiOx:H can be conveniently tuned over a wide range to fulfil the requirements for solar cell applications. We have shown that adding of PH3 gas during deposition tends to increase crystallinity of μc-SiOx:H layers, while additional trimethylboron (TMB) tends to suppress crystalline growth. When applied in tandem solar cells, both p- and n-type μc-SiOx:H lead to a remarkable increase in the top cell current. Taking advantage of low refractive index and high optical band gap of μc-SiOx:H allows the achievement of high efficiencies of 13.1% (initial) and 11.8% (stabilized)
536 _ _ |a 111 - Thin Film Photovoltaics (POF2-111)
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588 _ _ |a Dataset connected to CrossRef, juser.fz-juelich.de
700 1 _ |a Lambertz, A.
|0 P:(DE-Juel1)130263
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700 1 _ |a Tillmanns, S.
|0 P:(DE-Juel1)130269
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700 1 _ |a Finger, F.
|0 P:(DE-Juel1)130238
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773 _ _ |a 10.1139/cjp-2013-0640
|g Vol. 92, no. 7/8, p. 932 - 935
|0 PERI:(DE-600)2021497-2
|n 7/8
|p 932 - 935
|t Canadian journal of physics
|v 92
|y 2014
|x 1208-6045
909 C O |o oai:juser.fz-juelich.de:171993
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910 1 _ |a Forschungszentrum Jülich GmbH
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|v Thin Film Photovoltaics
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914 1 _ |y 2014
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