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037 _ _ |a FZJ-2014-05554
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100 1 _ |a Ding, Kaining
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245 _ _ |a Wide Gap Microcrystalline Silicon Oxide Emitter for a-SiO $_{x}$ :H/c-Si Heterojunction Solar Cells
260 _ _ |a Bristol
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520 _ _ |a This paper reports on the development of phosphorous doped microcrystalline silicon oxide (µc-SiOx:H) films as an emitter window layer in flat p-type silicon heterojunction (SHJ) solar cells featuring intrinsic a-SiOx:H buffer layers. We investigated the material properties of n-type µc-SiOx:H films grown at various input gas ratios and correlated the results of SHJ solar cells utilizing varying oxygen content and thickness of the emitter layer to the corresponding film properties. A maximum efficiency of 19.0% was achieved. The excellent short circuit current of 35.8 mA/cm2 for flat cells was attributed to the low optical losses in the emitter window.
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700 1 _ |a Aeberhard, Urs
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700 1 _ |a Smirnov, Vladimir
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700 1 _ |a Holländer, Bernhard
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700 1 _ |a Finger, Friedhelm
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700 1 _ |a Rau, Uwe
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773 _ _ |a 10.7567/JJAP.52.122304
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