TY  - JOUR
AU  - Schäfer, Anna
AU  - Wendt, Fabian
AU  - Mantl, Siegfried
AU  - Hardtdegen, Hilde
AU  - Mikulics, Martin
AU  - Schubert, Jürgen
AU  - Luysberg, Martina
AU  - Besmehn, Astrid
AU  - Niu, Gang
AU  - Schroeder, Thomas
TI  - Hexagonal LaLuO3 as high-κ dielectric
JO  - Journal of vacuum science & technology / B
VL  - 33
IS  - 1
SN  - 2166-2754
CY  - New York, NY
PB  - Inst.
M1  - FZJ-2015-00021
SP  - 01A104 
PY  - 2015
AB  - Among the different polymorphs of LaLuO3 the hexagonal one is the least explored. Therefore, in this work, hexagonal LaLuO3 is grown and investigated in more detail. Two different growth templates are presented, offering the possibility to stabilize this hexagonal phase: Y2O3 on Si (111) and GaN on Al2O3 (0001). The LaLuO3 layers show smooth surfaces and high crystallinity for both types of templates. Spectroscopic characterization reveals a wide bandgap Eg of 5.6 eV and capacitance voltage measurements display a relative permittivity κ of 26, which makes hexagonal LaLuO3 a promising candidate as a future gate dielectric for devices based on hexagonal semiconductors such as GaN.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000348915500004
DO  - DOI:10.1116/1.4904401
UR  - https://juser.fz-juelich.de/record/185884
ER  -