% IMPORTANT: The following is UTF-8 encoded. This means that in the presence % of non-ASCII characters, it will not work with BibTeX 0.99 or older. % Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or % “biber”. @ARTICLE{Schfer:185884, author = {Schäfer, Anna and Wendt, Fabian and Mantl, Siegfried and Hardtdegen, Hilde and Mikulics, Martin and Schubert, Jürgen and Luysberg, Martina and Besmehn, Astrid and Niu, Gang and Schroeder, Thomas}, title = {{H}exagonal {L}a{L}u{O}3 as high-κ dielectric}, journal = {Journal of vacuum science $\&$ technology / B}, volume = {33}, number = {1}, issn = {2166-2754}, address = {New York, NY}, publisher = {Inst.}, reportid = {FZJ-2015-00021}, pages = {01A104}, year = {2015}, abstract = {Among the different polymorphs of LaLuO3 the hexagonal one is the least explored. Therefore, in this work, hexagonal LaLuO3 is grown and investigated in more detail. Two different growth templates are presented, offering the possibility to stabilize this hexagonal phase: Y2O3 on Si (111) and GaN on Al2O3 (0001). The LaLuO3 layers show smooth surfaces and high crystallinity for both types of templates. Spectroscopic characterization reveals a wide bandgap Eg of 5.6 eV and capacitance voltage measurements display a relative permittivity κ of 26, which makes hexagonal LaLuO3 a promising candidate as a future gate dielectric for devices based on hexagonal semiconductors such as GaN.}, cin = {PGI-9 / PGI-5 / ZEA-3 / JARA-FIT}, ddc = {530}, cid = {I:(DE-Juel1)PGI-9-20110106 / I:(DE-Juel1)PGI-5-20110106 / I:(DE-Juel1)ZEA-3-20090406 / $I:(DE-82)080009_20140620$}, pnm = {521 - Controlling Electron Charge-Based Phenomena (POF3-521)}, pid = {G:(DE-HGF)POF3-521}, typ = {PUB:(DE-HGF)16}, UT = {WOS:000348915500004}, doi = {10.1116/1.4904401}, url = {https://juser.fz-juelich.de/record/185884}, }