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@ARTICLE{vandenHurk:187625,
author = {van den Hurk, Jan and Dippel, Ann-Christin and Cho,
Deok-Yong and Straquadine, Joshua and Breuer, Uwe and
Walter, Peter and Waser, R. and Valov, Ilia},
title = {{P}hysical origins and suppression of {A}g dissolution in
{G}e{S} x -based {ECM} cells21},
journal = {Physical chemistry, chemical physics},
volume = {16},
number = {34},
issn = {1463-9084},
address = {Cambridge},
publisher = {RSC Publ.},
reportid = {FZJ-2015-01251},
pages = {18217-18225},
year = {2014},
abstract = {Electrochemical metallisation (ECM) memory cells
potentially suffer from limited memory retention time, which
slows down the future commercialisation of this type of data
memory. In this work, we investigate Ag/GeSx/Pt redox-based
resistive memory cells (ReRAM) with and without an
additional Ta barrier layer by time-of-flight secondary ion
mass spectrometry (ToF-SIMS), X-ray absorption spectroscopy
(XAS) and synchrotron high-energy X-ray diffractometry (XRD)
to investigate the physical mechanism behind the shift
and/or loss of OFF data retention. Electrical measurements
demonstrate the effectiveness and high potential of the
diffusion barrier layer in practical applications.},
cin = {ZEA-3 / PGI-7 / JARA-FIT},
ddc = {540},
cid = {I:(DE-Juel1)ZEA-3-20090406 / I:(DE-Juel1)PGI-7-20110106 /
$I:(DE-82)080009_20140620$},
pnm = {421 - Frontiers of charge based Electronics (POF2-421)},
pid = {G:(DE-HGF)POF2-421},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000341064600020},
doi = {10.1039/C4CP01759E},
url = {https://juser.fz-juelich.de/record/187625},
}