%0 Conference Paper
%A Moers, J.
%A Trellenkamp, St.
%A Rienks, B.
%T Optimised marker definition for high overlay accuracy e-beam lithography
%M PreJuSER-18867
%D 2011
%Z Record converted from VDB: 12.11.2012
%< 37th international Conference on Micro- and Nanoengineering MNE 2011
Y2 19 Sep 2011
M2 Berlin, 
%F PUB:(DE-HGF)24
%9 Poster
%U https://juser.fz-juelich.de/record/18867