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Optimised marker definition for high overlay accuracy e-beam lithography

 ;  ;

2011

37th international Conference on Micro- and Nanoengineering MNE 2011
Seminar, BerlinBerlin, 19 Sep 20112011-09-19


Note: Record converted from VDB: 12.11.2012
Contributing Institute(s):
  1. Halbleiter-Nanoelektronik (PGI-9)
  2. Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology (JARA-FIT)
  3. Bioelektronik (PGI-8)
Research Program(s):
  1. Grundlagen für zukünftige Informationstechnologien (P42)

Appears in the scientific report 2011
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The record appears in these collections:
JARA > JARA > JARA-JARA\-FIT
Document types > Presentations > Poster
Institute Collections > PGI > PGI-9
Workflow collections > Public records
Publications database
PGI-8
 Record created 2012-11-13, last modified 2018-02-08
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