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@INPROCEEDINGS{Moers:18867,
      author       = {Moers, J. and Trellenkamp, St. and Rienks, B.},
      title        = {{O}ptimised marker definition for high overlay accuracy
                      e-beam lithography},
      reportid     = {PreJuSER-18867},
      year         = {2011},
      note         = {Record converted from VDB: 12.11.2012},
      comment      = {37th international Conference on Micro- and Nanoengineering
                      MNE 2011},
      booktitle     = {37th international Conference on
                       Micro- and Nanoengineering MNE 2011},
      month         = {Sep},
      date          = {2011-09-19},
      organization  = {Berlin, 19 Sep 2011},
      cin          = {JARA-FIT / PGI-9 / PGI-8},
      cid          = {$I:(DE-82)080009_20140620$ / I:(DE-Juel1)PGI-9-20110106 /
                      I:(DE-Juel1)PGI-8-20110106},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      typ          = {PUB:(DE-HGF)24},
      url          = {https://juser.fz-juelich.de/record/18867},
}