TY  - JOUR
AU  - Dauber, J.
AU  - Terrés, B.
AU  - Volk, Christian
AU  - Trellenkamp, S.
AU  - Stampfer, C.
TI  - Reducing disorder in graphene nanoribbons by chemical edge modification
JO  - Applied physics letters
VL  - 104
IS  - 8
SN  - 1077-3118
CY  - Melville, NY
PB  - American Inst. of Physics
M1  - FZJ-2015-02792
SP  - 083105
PY  - 2014
AB  - We present electronic transport measurements on etched graphene nanoribbons on silicon dioxide before and after a short hydrofluoric acid (HF) treatment. We report on changes in the transport properties, in particular, in terms of a decreasing transport gap and a reduced doping level after HF dipping. Interestingly, the effective energy gap is nearly unaffected by the HF treatment. Additional measurements on a graphene nanoribbon with lateral graphene gates support strong indications that the HF significantly modifies the edges of the investigated nanoribbons leading to a significantly reduced disorder potential in these graphene nanostructures.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000332619100106
DO  - DOI:10.1063/1.4866289
UR  - https://juser.fz-juelich.de/record/189762
ER  -