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@ARTICLE{Mller:189764,
author = {Müller, M. R. and Gumprich, A. and Schütte, F. and
Kallis, K. and Künzelmann, U. and Engels, S. and Stampfer,
C. and Wilck, N. and Knoch, J.},
title = {{B}uried triple-gate structures for advanced field-effect
transistor devices},
journal = {Microelectronic engineering},
volume = {119},
issn = {0167-9317},
address = {[S.l.] @},
publisher = {Elsevier},
reportid = {FZJ-2015-02794},
pages = {95 - 99},
year = {2014},
abstract = {One key element in the investigation of novel channel
materials and device principles is the realization of an
appropriate source–drain doping profile. The paper at hand
describes the manufacturing of a buried triple-gate (BTG)
structure, where three separately addressable gates are
implemented to control the charge carrier density within
source, drain, and the channel of a field-effect transistor.
The BTG structure is optimized for the investigation of
graphene, and a 30 nm graphene nanoribbon is fabricated on
top of the structure. Electrical measurements at 25 K
indicate the successful realization of p-n junctions and
demonstrate band-to-band tunneling at the source–channel
and channel–drain interfaces.},
cin = {PGI-9 / JARA-FIT},
ddc = {620},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {421 - Frontiers of charge based Electronics (POF2-421)},
pid = {G:(DE-HGF)POF2-421},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000343364400021},
doi = {10.1016/j.mee.2014.02.001},
url = {https://juser.fz-juelich.de/record/189764},
}