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@ARTICLE{Nishi:201540,
author = {Nishi, Yoshifumi and Menzel, Stephan and Fleck, Karsten and
Bottger, Ulrich and Waser, Rainer},
title = {{O}rigin of the {SET} {K}inetics of the {R}esistive
{S}witching in {T}antalum {O}xide {T}hin {F}ilms},
journal = {IEEE electron device letters},
volume = {35},
number = {2},
issn = {1558-0563},
address = {New York, NY},
publisher = {IEEE},
reportid = {FZJ-2015-03834},
pages = {259 - 261},
year = {2014},
abstract = {In this letter, we discuss the kinetics of the resistive
switch effect in tantalum oxide thin films. The time to
switch from the high resistance state to the low resistance
state (SET) was measured by using pulse measurement
technique. It was found that the SET switching time has a
clear relationship with the power of the leakage current
flowing under the applied voltage before the SET. Although
the dependence of the SET time on the applied voltage differ
from cell to cell, this relationship is universal among the
different cells. This implies that the Joule heating effect
is the dominant driving factor of the SET, rather than the
applied voltage. In addition, this relationship can account
for the faster switching speed at an elevated temperature.},
cin = {PGI-7},
ddc = {620},
cid = {I:(DE-Juel1)PGI-7-20110106},
pnm = {421 - Frontiers of charge based Electronics (POF2-421)},
pid = {G:(DE-HGF)POF2-421},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000331377500037},
doi = {10.1109/LED.2013.2294868},
url = {https://juser.fz-juelich.de/record/201540},
}