% IMPORTANT: The following is UTF-8 encoded. This means that in the presence
% of non-ASCII characters, it will not work with BibTeX 0.99 or older.
% Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or
% “biber”.
@ARTICLE{Kim:201893,
author = {Kim, Seong Keun and Hoffmann-Eifert, Susanne and Waser, R.},
title = {{H}igh {G}rowth {R}ate in {A}tomic {L}ayer {D}eposition of
{T}i{O}$_{2}$ thin films by {UV} {I}rradiation},
journal = {Electrochemical and solid-state letters},
volume = {14},
number = {4},
issn = {1099-0062},
address = {Pennington, NJ},
publisher = {Soc.},
reportid = {FZJ-2015-04183},
pages = {H146 -},
year = {2011},
abstract = {The exposure effect of the reaction surface to ultraviolet
(UV) light was studied for atomic layer deposition (ALD) of
TiO2 films from Ti(OiPr)4 and H2O at 260°C. UV light was
irradiated on the reaction surface after the purge step of
Ti-precursor and oxygen source, respectively. UV irradiation
on the reaction surface resulted in a higher growth rate of
the TiO2 films compared to the thermal ALD. The growth rate
of anatase TiO2 increased by a factor of 2 to about 0.25
nm/cycle while the surface roughness was reduced. UV-light
induced increase of the number of chemisorption sites is
discussed as the possible mechanism.},
cin = {PGI-7 / JARA-FIT},
ddc = {540},
cid = {I:(DE-Juel1)PGI-7-20110106 / $I:(DE-82)080009_20140620$},
pnm = {424 - Exploratory materials and phenomena (POF2-424)},
pid = {G:(DE-HGF)POF2-424},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000287408700014},
doi = {10.1149/1.3534833},
url = {https://juser.fz-juelich.de/record/201893},
}