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@ARTICLE{Kim:201893,
      author       = {Kim, Seong Keun and Hoffmann-Eifert, Susanne and Waser, R.},
      title        = {{H}igh {G}rowth {R}ate in {A}tomic {L}ayer {D}eposition of
                      {T}i{O}$_{2}$ thin films by {UV} {I}rradiation},
      journal      = {Electrochemical and solid-state letters},
      volume       = {14},
      number       = {4},
      issn         = {1099-0062},
      address      = {Pennington, NJ},
      publisher    = {Soc.},
      reportid     = {FZJ-2015-04183},
      pages        = {H146 -},
      year         = {2011},
      abstract     = {The exposure effect of the reaction surface to ultraviolet
                      (UV) light was studied for atomic layer deposition (ALD) of
                      TiO2 films from Ti(OiPr)4 and H2O at 260°C. UV light was
                      irradiated on the reaction surface after the purge step of
                      Ti-precursor and oxygen source, respectively. UV irradiation
                      on the reaction surface resulted in a higher growth rate of
                      the TiO2 films compared to the thermal ALD. The growth rate
                      of anatase TiO2 increased by a factor of 2 to about 0.25
                      nm/cycle while the surface roughness was reduced. UV-light
                      induced increase of the number of chemisorption sites is
                      discussed as the possible mechanism.},
      cin          = {PGI-7 / JARA-FIT},
      ddc          = {540},
      cid          = {I:(DE-Juel1)PGI-7-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {424 - Exploratory materials and phenomena (POF2-424)},
      pid          = {G:(DE-HGF)POF2-424},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000287408700014},
      doi          = {10.1149/1.3534833},
      url          = {https://juser.fz-juelich.de/record/201893},
}