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@ARTICLE{Urban:203087,
author = {Urban, C. and Emam, M. and Sandow, C. and Zhao, Q. T. and
Fox, A. and Mantl, S. and Raskin, J.-P.},
title = {{S}mall-signal analysis of high-performance p- and n-type
{SOI} {SB}-{MOSFET}s with dopant segregation},
journal = {Solid state electronics},
volume = {54},
number = {9},
issn = {0038-1101},
address = {Oxford [u.a.]},
publisher = {Pergamon, Elsevier Science},
reportid = {FZJ-2015-05122},
pages = {877 - 882},
year = {2010},
note = {ResearchGate. Available from:
$http://www.researchgate.net/publication/222231467_Small-signal_analysis_of_high-performance_p-_and_n-type_SOI_SB-MOSFETs_with_dopant_segregation$
[accessed Aug 4, 2015].},
abstract = {In this paper, we present fully-depleted Schottky barrier
MOSFETs with dopant-segregated NiSi source and drain
junctions. Schottky barrier MOSFETs with a channel length of
80 nm show high on-currents of 900 μA/μm for n-type
devices with As segregation at Vgs − Vt = 3 V and Vds =
1.2 V and 427 μA/μm for p-type devices with B segregation
at Vgs − Vt = −2.8 V and Vds = −1.2 V. A detailed
high-frequency characterization proves the high-performance
of the devices with cut-off frequencies fT of 117 GHz for
n-type and 63 GHz for p-type Schottky barrier MOSFETs and
clearly elucidates the effects of extrinsic and intrinsic
device parameters as a function of the gate length.},
cin = {PGI-9},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000280322300010},
doi = {10.1016/j.sse.2010.04.013},
url = {https://juser.fz-juelich.de/record/203087},
}