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@ARTICLE{Pham:203130,
author = {Pham, Anh-Tuan and Zhao, Qing-Tai and Jungemann, Christoph
and Meinerzhagen, Bernd and Mantl, Siegfried and Soree, Bart
and Pourtois, Geoffrey},
title = {{C}omparison of strained {S}i{G}e
heterostructure-on-insulator (001) and (110) {PMOSFET}s:
{C}–{V} characteristics, mobility, and {ON} currentgi-9},
journal = {Solid state electronics},
volume = {65-66},
issn = {0038-1101},
address = {Oxford [u.a.]},
publisher = {Pergamon, Elsevier Science},
reportid = {FZJ-2015-05145},
pages = {64 - 71},
year = {2011},
abstract = {Strained SiGe heterostructure-on-insulator (0 0 1) and (1 1
0) PMOSFETs are investigated including important aspects
like C–V characteristics, mobility, and ON current. The
simulations are based on the self-consistent solution of 6
× 6 k · p Schrödinger Equation, multi subband Boltzmann
Transport Equation and Poisson Equation, and capture size
quantization, strain, crystallographic orientation, and SiGe
alloy effects on a solid physical basis. The simulation
results are validated by comparison with different
experimental data sources. The simulation results show that
the strained SiGe HOI PMOSFET with (1 1 0) surface
orientation has a higher gate capacitance and a much higher
mobility and ON current compared to a similar device with
the traditional (0 0 1) surface orientation.},
cin = {PGI-9},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106},
pnm = {899 - ohne Topic (POF3-899)},
pid = {G:(DE-HGF)POF3-899},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000297182700012},
doi = {10.1016/j.sse.2011.06.021},
url = {https://juser.fz-juelich.de/record/203130},
}