000020333 001__ 20333
000020333 005__ 20180208232402.0
000020333 0247_ $$2pmid$$apmid:22414820
000020333 0247_ $$2DOI$$a10.1088/0957-4484/23/12/125302
000020333 0247_ $$2WOS$$aWOS:000301662400005
000020333 037__ $$aPreJuSER-20333
000020333 041__ $$aeng
000020333 082__ $$a530
000020333 084__ $$2WoS$$aNanoscience & Nanotechnology
000020333 084__ $$2WoS$$aMaterials Science, Multidisciplinary
000020333 084__ $$2WoS$$aPhysics, Applied
000020333 1001_ $$0P:(DE-Juel1)VDB74421$$aManheller, M.$$b0$$uFZJ
000020333 245__ $$aReliable fabrication of 3 nm gaps between nanoelectrodes by electron-beam lithography
000020333 260__ $$aBristol$$bIOP Publ.$$c2012
000020333 300__ $$a125302
000020333 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article
000020333 3367_ $$2DataCite$$aOutput Types/Journal article
000020333 3367_ $$00$$2EndNote$$aJournal Article
000020333 3367_ $$2BibTeX$$aARTICLE
000020333 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000020333 3367_ $$2DRIVER$$aarticle
000020333 440_0 $$04475$$aNanotechnology$$v23$$x0957-4484$$y12
000020333 500__ $$3POF3_Assignment on 2016-02-29
000020333 500__ $$aThe authors gratefully acknowledge the help of N Babajani, MGrates, R Borowski and H Haselier. This work was partially supported by the EU FP7 project 'MOLOC' and the 'Deutsche Forschungsgemeinschaft' (DFG).
000020333 520__ $$aThe reliable fabrication of nanoelectrode pairs with predefined separations in the few nanometer range is an essential prerequisite for future nanoelectronic devices. Here we demonstrate a fine-tuned electron-beam lithographic (EBL) fabrication route which is suitable for defining nanoelectrode pairs with a gap size down to 3 ± 1 nm and with a yield of 55%. This achievement is based on an optimized two-layer resist system in combination with an adopted developer system, as well as on an elaborated nanoelectrode pattern design taking into consideration the EBL inherent proximity effect. Thus, even a structural control in the nanometer scale is achieved in the EBL process.
000020333 536__ $$0G:(DE-Juel1)FUEK412$$2G:(DE-HGF)$$aGrundlagen für zukünftige Informationstechnologien$$cP42$$x0
000020333 588__ $$aDataset connected to Web of Science, Pubmed
000020333 650_7 $$2WoSType$$aJ
000020333 7001_ $$0P:(DE-Juel1)128856$$aTrellenkamp, S.$$b1$$uFZJ
000020333 7001_ $$0P:(DE-Juel1)131022$$aWaser, R.$$b2$$uFZJ
000020333 7001_ $$0P:(DE-Juel1)130751$$aKarthäuser, S.$$b3$$uFZJ
000020333 773__ $$0PERI:(DE-600)1362365-5$$a10.1088/0957-4484/23/12/125302$$gVol. 23, p. 125302$$p125302$$q23<125302$$tNanotechnology$$v23$$x0957-4484$$y2012
000020333 8567_ $$uhttp://dx.doi.org/10.1088/0957-4484/23/12/125302
000020333 909CO $$ooai:juser.fz-juelich.de:20333$$pVDB
000020333 9131_ $$0G:(DE-Juel1)FUEK412$$1G:(DE-HGF)POF2-420$$2G:(DE-HGF)POF2-400$$bSchlüsseltechnologien$$kP42$$lGrundlagen für zukünftige Informationstechnologien (FIT)$$vGrundlagen für zukünftige Informationstechnologien$$x0
000020333 9132_ $$0G:(DE-HGF)POF3-529H$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vAddenda$$x0
000020333 9141_ $$y2012
000020333 915__ $$0StatID:(DE-HGF)0010$$2StatID$$aJCR/ISI refereed
000020333 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR
000020333 915__ $$0StatID:(DE-HGF)0110$$2StatID$$aWoS$$bScience Citation Index
000020333 915__ $$0StatID:(DE-HGF)0111$$2StatID$$aWoS$$bScience Citation Index Expanded
000020333 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000020333 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bThomson Reuters Master Journal List
000020333 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000020333 915__ $$0StatID:(DE-HGF)0300$$2StatID$$aDBCoverage$$bMedline
000020333 915__ $$0StatID:(DE-HGF)0310$$2StatID$$aDBCoverage$$bNCBI Molecular Biology Database
000020333 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz
000020333 915__ $$0StatID:(DE-HGF)1030$$2StatID$$aDBCoverage$$bCurrent Contents - Life Sciences
000020333 915__ $$0StatID:(DE-HGF)1150$$2StatID$$aDBCoverage$$bCurrent Contents - Physical, Chemical and Earth Sciences
000020333 9201_ $$0I:(DE-82)080009_20140620$$gJARA$$kJARA-FIT$$lJülich-Aachen Research Alliance - Fundamentals of Future Information Technology$$x1
000020333 9201_ $$0I:(DE-Juel1)PGI-7-20110106$$gPGI$$kPGI-7$$lElektronische Materialien$$x0
000020333 9201_ $$0I:(DE-Juel1)PGI-8-20110106$$gPGI$$kPGI-8$$lBioelektronik$$x2
000020333 970__ $$aVDB:(DE-Juel1)135751
000020333 980__ $$aVDB
000020333 980__ $$aConvertedRecord
000020333 980__ $$ajournal
000020333 980__ $$aI:(DE-82)080009_20140620
000020333 980__ $$aI:(DE-Juel1)PGI-7-20110106
000020333 980__ $$aI:(DE-Juel1)PGI-8-20110106
000020333 980__ $$aUNRESTRICTED
000020333 981__ $$aI:(DE-Juel1)PGI-7-20110106
000020333 981__ $$aI:(DE-Juel1)PGI-8-20110106
000020333 981__ $$aI:(DE-Juel1)VDB881