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@ARTICLE{Manheller:20333,
      author       = {Manheller, M. and Trellenkamp, S. and Waser, R. and
                      Karthäuser, S.},
      title        = {{R}eliable fabrication of 3 nm gaps between nanoelectrodes
                      by electron-beam lithography},
      journal      = {Nanotechnology},
      volume       = {23},
      issn         = {0957-4484},
      address      = {Bristol},
      publisher    = {IOP Publ.},
      reportid     = {PreJuSER-20333},
      pages        = {125302},
      year         = {2012},
      note         = {The authors gratefully acknowledge the help of N Babajani,
                      MGrates, R Borowski and H Haselier. This work was partially
                      supported by the EU FP7 project 'MOLOC' and the 'Deutsche
                      Forschungsgemeinschaft' (DFG).},
      abstract     = {The reliable fabrication of nanoelectrode pairs with
                      predefined separations in the few nanometer range is an
                      essential prerequisite for future nanoelectronic devices.
                      Here we demonstrate a fine-tuned electron-beam lithographic
                      (EBL) fabrication route which is suitable for defining
                      nanoelectrode pairs with a gap size down to 3 ± 1 nm and
                      with a yield of $55\%.$ This achievement is based on an
                      optimized two-layer resist system in combination with an
                      adopted developer system, as well as on an elaborated
                      nanoelectrode pattern design taking into consideration the
                      EBL inherent proximity effect. Thus, even a structural
                      control in the nanometer scale is achieved in the EBL
                      process.},
      keywords     = {J (WoSType)},
      cin          = {JARA-FIT / PGI-7 / PGI-8},
      ddc          = {530},
      cid          = {$I:(DE-82)080009_20140620$ / I:(DE-Juel1)PGI-7-20110106 /
                      I:(DE-Juel1)PGI-8-20110106},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      shelfmark    = {Nanoscience $\&$ Nanotechnology / Materials Science,
                      Multidisciplinary / Physics, Applied},
      typ          = {PUB:(DE-HGF)16},
      pubmed       = {pmid:22414820},
      UT           = {WOS:000301662400005},
      doi          = {10.1088/0957-4484/23/12/125302},
      url          = {https://juser.fz-juelich.de/record/20333},
}