%0 Thesis
%A Hospach, Andreas
%T Untersuchung zum Thin Film Low Pressure Plasma Spraying (LPPS-TF) Prozess
%V 140
%I Ruhr-Universität Bochum
%V Dr. (Univ.)
%C Jülich
%M PreJuSER-22357
%@ 978-3-89336-787-0
%B Schriften des Forschungszentrums Jülich : Energie & Umwelt / Energy & Environment
%P 165 S.
%D 2012
%Z Record converted from VDB: 12.11.2012
%Z Ruhr-Universität Bochum, Diss., 2012
%X Limmited natural resources require a more efficient use of them. Therefore, thin-film technologies are used widely to increase the performance of power converters by a refinement of the component surfaces. Large industrial applicaitons are, amongst others, coating processes such as plasma spraying or physical respectively chemical vapor deposition (PVD/CVD). As a ling between these processes the relatively new thin-film low-pressure plasma spraying (LPPS-TF) is considered. The potential of this coating process is not yet clear. Hence, fundamental questions about powder evaporation and layer growth should be answered in this work. [...]
%F PUB:(DE-HGF)11 ; PUB:(DE-HGF)3
%9 Dissertation / PhD ThesisBook
%U https://juser.fz-juelich.de/record/22357