Dissertation / PhD Thesis/Book

PreJuSER-22357

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Untersuchung zum Thin Film Low Pressure Plasma Spraying (LPPS-TF) Prozess

Hospach, A. (Corresponding author)FZJ*

2012
Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag Jülich
ISBN: 978-3-89336-787-0

Abstract: Limmited natural resources require a more efficient use of them. Therefore, thin-film technologies are used widely to increase the performance of power converters by a refinement of the component surfaces. Large industrial applicaitons are, amongst others, coating processes such as plasma spraying or physical respectively chemical vapor deposition (PVD/CVD). As a ling between these processes the relatively new thin-film low-pressure plasma spraying (LPPS-TF) is considered. The potential of this coating process is not yet clear. Hence, fundamental questions about powder evaporation and layer growth should be answered in this work. [...]

Note: Record converted from VDB: 12.11.2012
Note: Ruhr-Universität Bochum, Diss., 2012

---

Contributing Institute(s):

1. Werkstoffsynthese und Herstellverfahren (IEK-1)

Research Program(s):

1. Rationelle Energieumwandlung (P12)

Appears in the scientific report 2012

---