TY  - THES
AU  - Hospach, Andreas
TI  - Untersuchung zum Thin Film Low Pressure Plasma Spraying (LPPS-TF) Prozess
VL  - 140
PB  - Ruhr-Universität Bochum
VL  - Dr. (Univ.)
CY  - Jülich
M1  - PreJuSER-22357
SN  - 978-3-89336-787-0
T2  - Schriften des Forschungszentrums Jülich : Energie & Umwelt / Energy & Environment
SP  - 165 S.
PY  - 2012
N1  - Record converted from VDB: 12.11.2012
N1  - Ruhr-Universität Bochum, Diss., 2012
AB  - Limmited natural resources require a more efficient use of them. Therefore, thin-film technologies are used widely to increase the performance of power converters by a refinement of the component surfaces. Large industrial applicaitons are, amongst others, coating processes such as plasma spraying or physical respectively chemical vapor deposition (PVD/CVD). As a ling between these processes the relatively new thin-film low-pressure plasma spraying (LPPS-TF) is considered. The potential of this coating process is not yet clear. Hence, fundamental questions about powder evaporation and layer growth should be answered in this work. [...]
LB  - PUB:(DE-HGF)11 ; PUB:(DE-HGF)3
UR  - https://juser.fz-juelich.de/record/22357
ER  -