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024 7 _ |2 DOI
|a 10.1016/j.tsf.2011.04.098
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041 _ _ |a eng
082 _ _ |a 070
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|a Materials Science, Multidisciplinary
084 _ _ |2 WoS
|a Materials Science, Coatings & Films
084 _ _ |2 WoS
|a Physics, Applied
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Zhang, W.
|b 0
|u FZJ
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245 _ _ |a As-grown textured zinc oxide films by ion beam treatment and magnetron sputtering
260 _ _ |a Amsterdam [u.a.]
|b Elsevier
|c 2012
300 _ _ |a 4208 - 4213
336 7 _ |a Journal Article
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440 _ 0 |a Thin Solid Films
|x 0040-6090
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500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a This work presents as-grown textured ZnO:Al films by rf magnetron sputtering initiated by pre-treatment of glass substrate with mixed argon and oxygen ions. A 650 nm thick of this film exhibits surface texture features with lateral size around 500 nm; the resistivity is below 5 x 10(-4) Omega . cm and the transparency in the near-infrared spectral range is high (>80% at 1000 nm). Microcrystalline silicon thin film solar cells grown on the textured glass exhibit excellent light trapping effect with a short circuit current density of 18.2 mA/cm(2). (C) 2011 Elsevier B.V. All rights reserved.
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653 2 0 |2 Author
|a Ion beam treatment
653 2 0 |2 Author
|a Magnetron sputtering
653 2 0 |2 Author
|a ZnO:Al films
653 2 0 |2 Author
|a TCO
653 2 0 |2 Author
|a Solar cells
700 1 _ |a Bunte, E.
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700 1 _ |a Ruske, F.
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700 1 _ |a Köhl, D.
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700 1 _ |a Besmehn, A.
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700 1 _ |a Worbs, J.
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700 1 _ |a Siekmann, H.
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700 1 _ |a Kirchhoff, J.
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700 1 _ |a Gordijn, A
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700 1 _ |a Hüpkes, J.
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773 _ _ |a 10.1016/j.tsf.2011.04.098
|g Vol. 520, p. 4208 - 4213
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|t Thin solid films
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856 7 _ |u http://dx.doi.org/10.1016/j.tsf.2011.04.098
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|v Solar cells of the next generation
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914 1 _ |y 2012
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