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| Home > Publications database > On the microscopic origin of the kinetic step bunching instability of vicinal Si(001) |
| Journal Article | PreJuSER-24644 |
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2002
Elsevier
Amsterdam
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Please use a persistent id in citations: doi:10.1016/S0039-6028(02)02273-2
Abstract: A scanning tunneling microscopy/atomic force microscopy study is presented of a kinetically driven growth instability, which leads to the formation of ripples during Si homoepitaxy on slightly vicinal Si(001) surfaces miscut in [110] direction. The instability is identified as step bunching, that occurs under step-flow growth conditions and vanishes both during low-temperature island growth and at high temperatures. We demonstrate, that the growth instability with the same characteristics is observed in two dimensional kinetic Monte Carlo simulation with included Si(001)-like diffusion anisotropy. The instability is mainly caused by the interplay between diffusion anisotropy and the attachment/detachment kinetics at the different step types on Si(001) surface. This new instability mechanism does not require any additional step edge barriers to diffusion of adatoms. In addition, the evolution of ripple height and periodicity was analyzed experimentally as a function of layer thickness. A lateral "ripple-zipper" mechanism is proposed for the coarsening of the ripples. (C) 2002 Elsevier Science B.V. All rights reserved.
Keyword(s): J ; silicon (auto) ; vicinal single crystal surfaces (auto) ; molecular beam epitaxy (auto) ; step formation and bunching (auto) ; scanning tunneling microscopy (auto) ; surface structure, morphology, roughness and topography (auto) ; Monte Carlo simulations (auto) ; surface diffusion (auto)
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