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@ARTICLE{Jeliazova:25274,
      author       = {Jeliazova, Y. and Franchy, R.},
      title        = {{T}he growth of ultrathin {A}l2{O}3 films on {C}u(111)},
      journal      = {Applied surface science},
      volume       = {187},
      issn         = {0169-4332},
      address      = {Amsterdam},
      publisher    = {North-Holland},
      reportid     = {PreJuSER-25274},
      pages        = {51 - 59},
      year         = {2002},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {The growth of ultrathin films of Al2O3 on Cu(111) in the
                      temperature range 300-1200 K was investigated by using Auger
                      electron spectroscopy (AES), low-energy electron diffraction
                      (LEED) and high-resolution electron energy loss spectroscopy
                      (HREELS). Eight monolayers of a mixture of nickel and
                      aluminum (Ni:Al = 1:2) were deposited on Cu(l 1 1) at 300 K
                      by simultaneous evaporation of both Ni and Al from NiAl
                      crystal material. The bimetal layer was oxidized at 300 K
                      until saturation and annealed gradually to 1200 K. During
                      oxygen adsorption, only aluminum is oxidized. Annealing of
                      the oxidized layer to 1200 K leads to the formation of a
                      well-ordered aluminum oxide. The HREEL spectra show the
                      characteristic Fuchs-Kliever phonons of Al2O3 (410, 620 and
                      885 cm(-1)). During annealing, Ni diffuses into the Cu(I 1
                      1) substrate. The LEED pattern of the ultrathin oxide layer
                      has a hexagonal structure with a lattice constant of 3.1
                      Angstrom, which corresponds to the distance between two
                      oxygen ions in the aluminum oxide. (C) 2002 Elsevier Science
                      B.V. All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {ISG-3},
      ddc          = {670},
      cid          = {I:(DE-Juel1)VDB43},
      pnm          = {Kondensierte Materie},
      pid          = {G:(DE-Juel1)FUEK242},
      shelfmark    = {Chemistry, Physical / Materials Science, Coatings $\&$
                      Films / Physics, Applied / Physics, Condensed Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000175089200006},
      doi          = {10.1016/S0169-4332(01)00773-5},
      url          = {https://juser.fz-juelich.de/record/25274},
}