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| Home > Publications database > Light Management in Silicon Heterojunction Solar Cells via Nanocrystalline Silicon Oxide Films and Nano-Imprint Textures |
| Home > Publications database > Light Management in Silicon Heterojunction Solar Cells via Nanocrystalline Silicon Oxide Films and Nano-Imprint Textures |
| Conference Presentation (Other) | FZJ-2015-05773 |
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2015
Abstract: Excellent light management is essential to increase the amount of light being captured in the absorber of silicon heterojunction solar cells in order to obtain a high photoelectric current. Three possible ways to achieve this are improving the cell anti-reflectance, increasing the light path through the absorber material, and minimizing the parasitic losses in the other layers. The former two goals can be realized via surface texturing and the latter by using highly transparent materials. In this study, we focus on implementing hydrogenated nanocrystalline silicon oxide (nc‑SiOx:H) in combination with front side nano-imprint textures in silicon heterojuction solar cells. Nc‑SiOx:H offering a unique combination of high conductivity and high transparency is perfectly suited as an alternative wide-gap doped layer to minimize parasitic absorption. At the same time, nano-imprint technology provides a way to realize various textures on “flat” silicon solar cells without inevitably promoting recombination at the absorber interface by enlarging the surface area and increasing the number of defect states. We show by a systematic investigation how the interplay between the imprinted layer and the underlying thin films of the silicon heterojunction based solar cell affects the generated current. Ultimately, we demonstrate very high current densities and efficiencies beyond 20% without wet-chemically texturing the Si-wafer by combining the benefits of the highly transparent nanocrystalline silicon oxide layers and the favourable properties of the nano-imprint technology.
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