000255700 001__ 255700
000255700 005__ 20210129220525.0
000255700 037__ $$aFZJ-2015-05830
000255700 041__ $$aEnglish
000255700 1001_ $$0P:(DE-Juel1)125593$$aHardtdegen, Hilde$$b0$$eCorresponding author$$ufzj
000255700 1112_ $$a41st International Conference on Micro- and Nano- Engineering$$cThe Hague$$d2015-09-21 - 2015-09-24$$gMNE2015$$wNetherlands
000255700 245__ $$aTowards Single Photon Lithography
000255700 260__ $$c2015
000255700 3367_ $$0PUB:(DE-HGF)6$$2PUB:(DE-HGF)$$aConference Presentation$$bconf$$mconf$$s1443438563_3800$$xOther
000255700 3367_ $$033$$2EndNote$$aConference Paper
000255700 3367_ $$2DataCite$$aOther
000255700 3367_ $$2ORCID$$aLECTURE_SPEECH
000255700 3367_ $$2DRIVER$$aconferenceObject
000255700 3367_ $$2BibTeX$$aINPROCEEDINGS
000255700 520__ $$aA novel mask-less lithography approach and its technological realization are presented for a simple, fast and flexible nanostructure mass-production. It is based on the use of single photon sources for exposure. A proof of principal is demonstrated using vertically integrated singularly addressable nano-LEDs assembled in arrays.
000255700 536__ $$0G:(DE-HGF)POF3-521$$a521 - Controlling Electron Charge-Based Phenomena (POF3-521)$$cPOF3-521$$fPOF III$$x0
000255700 7001_ $$0P:(DE-Juel1)128613$$aMikulics, Martin$$b1$$ufzj
000255700 909CO $$ooai:juser.fz-juelich.de:255700$$pVDB
000255700 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)125593$$aForschungszentrum Jülich GmbH$$b0$$kFZJ
000255700 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128613$$aForschungszentrum Jülich GmbH$$b1$$kFZJ
000255700 9131_ $$0G:(DE-HGF)POF3-521$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Electron Charge-Based Phenomena$$x0
000255700 9141_ $$y2015
000255700 9201_ $$0I:(DE-Juel1)PGI-9-20110106$$kPGI-9$$lHalbleiter-Nanoelektronik$$x0
000255700 980__ $$aconf
000255700 980__ $$aVDB
000255700 980__ $$aI:(DE-Juel1)PGI-9-20110106
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