Conference Presentation (Other)

FZJ-2015-05830

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Towards Single Photon Lithography

Hardtdegen, H. (Corresponding author)FZJ* ; Mikulics, M.FZJ*

2015

Abstract: A novel mask-less lithography approach and its technological realization are presented for a simple, fast and flexible nanostructure mass-production. It is based on the use of single photon sources for exposure. A proof of principal is demonstrated using vertically integrated singularly addressable nano-LEDs assembled in arrays.

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Contributing Institute(s):

1. Halbleiter-Nanoelektronik (PGI-9)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2015

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