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@INPROCEEDINGS{Hardtdegen:255700,
      author       = {Hardtdegen, Hilde and Mikulics, Martin},
      title        = {{T}owards {S}ingle {P}hoton {L}ithography},
      reportid     = {FZJ-2015-05830},
      year         = {2015},
      abstract     = {A novel mask-less lithography approach and its
                      technological realization are presented for a simple, fast
                      and flexible nanostructure mass-production. It is based on
                      the use of single photon sources for exposure. A proof of
                      principal is demonstrated using vertically integrated
                      singularly addressable nano-LEDs assembled in arrays.},
      month         = {Sep},
      date          = {2015-09-21},
      organization  = {41st International Conference on
                       Micro- and Nano- Engineering, The Hague
                       (Netherlands), 21 Sep 2015 - 24 Sep
                       2015},
      subtyp        = {Other},
      cin          = {PGI-9},
      cid          = {I:(DE-Juel1)PGI-9-20110106},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)6},
      url          = {https://juser.fz-juelich.de/record/255700},
}