001     255700
005     20210129220525.0
037 _ _ |a FZJ-2015-05830
041 _ _ |a English
100 1 _ |a Hardtdegen, Hilde
|0 P:(DE-Juel1)125593
|b 0
|e Corresponding author
|u fzj
111 2 _ |a 41st International Conference on Micro- and Nano- Engineering
|g MNE2015
|c The Hague
|d 2015-09-21 - 2015-09-24
|w Netherlands
245 _ _ |a Towards Single Photon Lithography
260 _ _ |c 2015
336 7 _ |a Conference Presentation
|b conf
|m conf
|0 PUB:(DE-HGF)6
|s 1443438563_3800
|2 PUB:(DE-HGF)
|x Other
336 7 _ |a Conference Paper
|0 33
|2 EndNote
336 7 _ |a Other
|2 DataCite
336 7 _ |a LECTURE_SPEECH
|2 ORCID
336 7 _ |a conferenceObject
|2 DRIVER
336 7 _ |a INPROCEEDINGS
|2 BibTeX
520 _ _ |a A novel mask-less lithography approach and its technological realization are presented for a simple, fast and flexible nanostructure mass-production. It is based on the use of single photon sources for exposure. A proof of principal is demonstrated using vertically integrated singularly addressable nano-LEDs assembled in arrays.
536 _ _ |a 521 - Controlling Electron Charge-Based Phenomena (POF3-521)
|0 G:(DE-HGF)POF3-521
|c POF3-521
|f POF III
|x 0
700 1 _ |a Mikulics, Martin
|0 P:(DE-Juel1)128613
|b 1
|u fzj
909 C O |o oai:juser.fz-juelich.de:255700
|p VDB
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 0
|6 P:(DE-Juel1)125593
910 1 _ |a Forschungszentrum Jülich GmbH
|0 I:(DE-588b)5008462-8
|k FZJ
|b 1
|6 P:(DE-Juel1)128613
913 1 _ |a DE-HGF
|b Key Technologies
|l Future Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)
|1 G:(DE-HGF)POF3-520
|0 G:(DE-HGF)POF3-521
|2 G:(DE-HGF)POF3-500
|v Controlling Electron Charge-Based Phenomena
|x 0
|4 G:(DE-HGF)POF
|3 G:(DE-HGF)POF3
914 1 _ |y 2015
920 1 _ |0 I:(DE-Juel1)PGI-9-20110106
|k PGI-9
|l Halbleiter-Nanoelektronik
|x 0
980 _ _ |a conf
980 _ _ |a VDB
980 _ _ |a I:(DE-Juel1)PGI-9-20110106
980 _ _ |a UNRESTRICTED


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