000255938 001__ 255938 000255938 005__ 20240610121225.0 000255938 0247_ $$2doi$$a10.1021/acs.nanolett.5b01802 000255938 0247_ $$2ISSN$$a1530-6984 000255938 0247_ $$2ISSN$$a1530-6992 000255938 0247_ $$2WOS$$aWOS:000363003100023 000255938 037__ $$aFZJ-2015-06017 000255938 041__ $$aEnglish 000255938 082__ $$a540 000255938 1001_ $$0P:(DE-HGF)0$$aDíaz Álvarez, Adrian$$b0 000255938 245__ $$aNonstoichiometric Low-Temperature Grown GaAs Nanowires 000255938 260__ $$aWashington, DC$$bACS Publ.$$c2015 000255938 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1444899254_25081 000255938 3367_ $$2DataCite$$aOutput Types/Journal article 000255938 3367_ $$00$$2EndNote$$aJournal Article 000255938 3367_ $$2BibTeX$$aARTICLE 000255938 3367_ $$2ORCID$$aJOURNAL_ARTICLE 000255938 3367_ $$2DRIVER$$aarticle 000255938 520__ $$aThe structural and electronic properties of nonstoichiometric low-temperature grown GaAs nanowire shells have been investigated with scanning tunneling microscopy and spectroscopy, pump–probe reflectivity, and cathodoluminescence measurements. The growth of nonstoichiometric GaAs shells is achieved through the formation of As antisite defects, and to a lower extent, after annealing, As precipitates. Because of the high density of atomic steps on the nanowire sidewalls, the Fermi level is pinned midgap, causing the ionization of the subsurface antisites and the formation of depleted regions around the As precipitates. 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