000025957 001__ 25957
000025957 005__ 20180210134746.0
000025957 0247_ $$2DOI$$a10.1080/00150190210989
000025957 0247_ $$2WOS$$aWOS:000176861100033
000025957 037__ $$aPreJuSER-25957
000025957 041__ $$aeng
000025957 082__ $$a530
000025957 084__ $$2WoS$$aMaterials Science, Multidisciplinary
000025957 084__ $$2WoS$$aPhysics, Condensed Matter
000025957 1001_ $$0P:(DE-HGF)0$$aSchneller, T.$$b0
000025957 245__ $$aChemical solution deposition of ferroelectric thin films - state-of-the-art and recent trends
000025957 260__ $$aLondon [u.a.]$$bTaylor & Francis$$c2002
000025957 300__ $$a293 - 301
000025957 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article
000025957 3367_ $$2DataCite$$aOutput Types/Journal article
000025957 3367_ $$00$$2EndNote$$aJournal Article
000025957 3367_ $$2BibTeX$$aARTICLE
000025957 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000025957 3367_ $$2DRIVER$$aarticle
000025957 440_0 $$02058$$aFerroelectrics$$v267$$x0015-0193
000025957 500__ $$aRecord converted from VDB: 12.11.2012
000025957 520__ $$aChemical deposition methods include a wide spectrum of techniques ranging from chemical solution deposition (CSD) to Metal-Organic Chemical Vapor Deposition (MOCVD). After the short description of the complementary aspects, this review will focus on CSD summarizing the state of the art of the method for high-permittivity, ferroelectric, and other complex electronic oxide thin films. Aspects of the selection and the properties of the educts, the microscopic mechanism of the film deposition, and the tailoring of the microstructure by the deposition parameters will be discussed, due to their significant influence on the final film quality. To demonstrate the versatility and the potential of the CSD method, recent hot topics like the deposition of ultrathin films, lateral nanostructering, and the formation of single grains will be specifically discussed.
000025957 536__ $$0G:(DE-Juel1)FUEK252$$2G:(DE-HGF)$$aMaterialien, Prozesse und Bauelemente für die  Mikro- und Nanoelektronik$$cI01$$x0
000025957 588__ $$aDataset connected to Web of Science
000025957 650_7 $$2WoSType$$aJ
000025957 65320 $$2Author$$aChemical Solution Deposition
000025957 65320 $$2Author$$aultrathin films
000025957 65320 $$2Author$$ananotechnology
000025957 65320 $$2Author$$asingle grains
000025957 65320 $$2Author$$aferroelectrics
000025957 65320 $$2Author$$adielectrics
000025957 65320 $$2Author$$amicrostructure
000025957 7001_ $$0P:(DE-Juel1)131022$$aWaser, R.$$b1$$uFZJ
000025957 773__ $$0PERI:(DE-600)2042895-9$$a10.1080/00150190210989$$gVol. 267, p. 293 - 301$$p293 - 301$$q267<293 - 301$$tFerroelectrics$$v267$$x0015-0193$$y2002
000025957 909CO $$ooai:juser.fz-juelich.de:25957$$pVDB
000025957 9131_ $$0G:(DE-Juel1)FUEK252$$bInformation$$kI01$$lInformationstechnologie mit nanoelektronischen Systemen$$vMaterialien, Prozesse und Bauelemente für die  Mikro- und Nanoelektronik$$x0
000025957 9141_ $$y2002
000025957 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000025957 9201_ $$0I:(DE-Juel1)VDB35$$d31.12.2003$$gIFF$$kIFF-EKM$$lElektrokeramische Materialien$$x0
000025957 970__ $$aVDB:(DE-Juel1)17354
000025957 980__ $$aVDB
000025957 980__ $$aConvertedRecord
000025957 980__ $$ajournal
000025957 980__ $$aI:(DE-Juel1)PGI-7-20110106
000025957 980__ $$aUNRESTRICTED
000025957 981__ $$aI:(DE-Juel1)PGI-7-20110106