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@ARTICLE{Schneller:25957,
      author       = {Schneller, T. and Waser, R.},
      title        = {{C}hemical solution deposition of ferroelectric thin films
                      - state-of-the-art and recent trends},
      journal      = {Ferroelectrics},
      volume       = {267},
      issn         = {0015-0193},
      address      = {London [u.a.]},
      publisher    = {Taylor $\&$ Francis},
      reportid     = {PreJuSER-25957},
      pages        = {293 - 301},
      year         = {2002},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Chemical deposition methods include a wide spectrum of
                      techniques ranging from chemical solution deposition (CSD)
                      to Metal-Organic Chemical Vapor Deposition (MOCVD). After
                      the short description of the complementary aspects, this
                      review will focus on CSD summarizing the state of the art of
                      the method for high-permittivity, ferroelectric, and other
                      complex electronic oxide thin films. Aspects of the
                      selection and the properties of the educts, the microscopic
                      mechanism of the film deposition, and the tailoring of the
                      microstructure by the deposition parameters will be
                      discussed, due to their significant influence on the final
                      film quality. To demonstrate the versatility and the
                      potential of the CSD method, recent hot topics like the
                      deposition of ultrathin films, lateral nanostructering, and
                      the formation of single grains will be specifically
                      discussed.},
      keywords     = {J (WoSType)},
      cin          = {IFF-EKM},
      ddc          = {530},
      cid          = {I:(DE-Juel1)VDB35},
      pnm          = {Materialien, Prozesse und Bauelemente für die Mikro- und
                      Nanoelektronik},
      pid          = {G:(DE-Juel1)FUEK252},
      shelfmark    = {Materials Science, Multidisciplinary / Physics, Condensed
                      Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000176861100033},
      doi          = {10.1080/00150190210989},
      url          = {https://juser.fz-juelich.de/record/25957},
}