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| Hauptseite > Publikationsdatenbank > Chemical solution deposition of ferroelectric thin films - state-of-the-art and recent trends > print |
| Hauptseite > Publikationsdatenbank > Chemical solution deposition of ferroelectric thin films - state-of-the-art and recent trends > print |
| 001 | 25957 | ||
| 005 | 20180210134746.0 | ||
| 024 | 7 | _ | |2 DOI |a 10.1080/00150190210989 |
| 024 | 7 | _ | |2 WOS |a WOS:000176861100033 |
| 037 | _ | _ | |a PreJuSER-25957 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 530 |
| 084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
| 084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
| 100 | 1 | _ | |a Schneller, T. |b 0 |0 P:(DE-HGF)0 |
| 245 | _ | _ | |a Chemical solution deposition of ferroelectric thin films - state-of-the-art and recent trends |
| 260 | _ | _ | |a London [u.a.] |b Taylor & Francis |c 2002 |
| 300 | _ | _ | |a 293 - 301 |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Ferroelectrics |x 0015-0193 |0 2058 |v 267 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a Chemical deposition methods include a wide spectrum of techniques ranging from chemical solution deposition (CSD) to Metal-Organic Chemical Vapor Deposition (MOCVD). After the short description of the complementary aspects, this review will focus on CSD summarizing the state of the art of the method for high-permittivity, ferroelectric, and other complex electronic oxide thin films. Aspects of the selection and the properties of the educts, the microscopic mechanism of the film deposition, and the tailoring of the microstructure by the deposition parameters will be discussed, due to their significant influence on the final film quality. To demonstrate the versatility and the potential of the CSD method, recent hot topics like the deposition of ultrathin films, lateral nanostructering, and the formation of single grains will be specifically discussed. |
| 536 | _ | _ | |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |c I01 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK252 |x 0 |
| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 653 | 2 | 0 | |2 Author |a Chemical Solution Deposition |
| 653 | 2 | 0 | |2 Author |a ultrathin films |
| 653 | 2 | 0 | |2 Author |a nanotechnology |
| 653 | 2 | 0 | |2 Author |a single grains |
| 653 | 2 | 0 | |2 Author |a ferroelectrics |
| 653 | 2 | 0 | |2 Author |a dielectrics |
| 653 | 2 | 0 | |2 Author |a microstructure |
| 700 | 1 | _ | |a Waser, R. |b 1 |u FZJ |0 P:(DE-Juel1)131022 |
| 773 | _ | _ | |a 10.1080/00150190210989 |g Vol. 267, p. 293 - 301 |p 293 - 301 |q 267<293 - 301 |0 PERI:(DE-600)2042895-9 |t Ferroelectrics |v 267 |y 2002 |x 0015-0193 |
| 909 | C | O | |o oai:juser.fz-juelich.de:25957 |p VDB |
| 913 | 1 | _ | |k I01 |v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik |l Informationstechnologie mit nanoelektronischen Systemen |b Information |0 G:(DE-Juel1)FUEK252 |x 0 |
| 914 | 1 | _ | |y 2002 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 920 | 1 | _ | |k IFF-EKM |l Elektrokeramische Materialien |d 31.12.2003 |g IFF |0 I:(DE-Juel1)VDB35 |x 0 |
| 970 | _ | _ | |a VDB:(DE-Juel1)17354 |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a ConvertedRecord |
| 980 | _ | _ | |a journal |
| 980 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
| 980 | _ | _ | |a UNRESTRICTED |
| 981 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
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