%0 Conference Paper
%A Zhang, Hehe
%A Lee, W.
%A Xu, Chengcheng
%A Hardtdegen, Alexander
%A Menzel, Stephan
%A Hwang, C. S.
%A Waser, R.
%A Hoffmann-Eifert, Susanne
%T Comparison of the Resistance Switching Behavior of  Ex-situ and In-situ STO Thin Films grown by Atomic Layer Deposition
%M FZJ-2016-00791
%D 2015
%B European Materials Research Society meeting
%C 11 May 2015 - 15 May 2015, Lille (France)
Y2 11 May 2015 - 15 May 2015
M2 Lille, France
%F PUB:(DE-HGF)24
%9 Poster
%U https://juser.fz-juelich.de/record/281086