Poster

FZJ-2016-00791

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Comparison of the Resistance Switching Behavior of Ex-situ and In-situ STO Thin Films grown by Atomic Layer Deposition

Zhang, H.FZJ* ; Lee, W. ; Xu, C.FZJ* ; Hardtdegen, A.FZJ* ; Menzel, S.FZJ* ; Hwang, C. S. ; Waser, R.FZJ* ; Hoffmann-Eifert, S.FZJ*

2015

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Contributing Institute(s):

1. Elektronische Materialien (PGI-7)

Research Program(s):

1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2015

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Database coverage:
No Authors Fulltext

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