TY  - CONF
AU  - Zhang, Hehe
AU  - Lee, W.
AU  - Xu, Chengcheng
AU  - Hardtdegen, Alexander
AU  - Menzel, Stephan
AU  - Hwang, C. S.
AU  - Waser, R.
AU  - Hoffmann-Eifert, Susanne
TI  - Comparison of the Resistance Switching Behavior of  Ex-situ and In-situ STO Thin Films grown by Atomic Layer Deposition
M1  - FZJ-2016-00791
PY  - 2015
T2  - European Materials Research Society meeting
CY  - 11 May 2015 - 15 May 2015, Lille (France)
Y2  - 11 May 2015 - 15 May 2015
M2  - Lille, France
LB  - PUB:(DE-HGF)24
UR  - https://juser.fz-juelich.de/record/281086
ER  -