Journal Article

PreJuSER-28487

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png Growth of ultra-thin amorphous Al2O3 films on CoAl(100)

Rose, V.FZJ* ; Podgurski, V.FZJ* ; Costina, I.FZJ* ; Franchy, R.FZJ*

2003
Elsevier Amsterdam

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Please use a persistent id in citations: doi:10.1016/S0039-6028(03)00891-4

Abstract: The oxidation of a CoAl(100) surface at 300 K was studied by means of Auger electron spectroscopy, high resolution electron energy loss spectroscopy (EELS), low energy electron diffraction and scanning tunneling microscopy (STM). For an exposure less than or equal to 0.3 L, the oxygen atoms are chemisorbed on the CoAl(100) surface, while for a larger O-2 exposure the oxidation of the surface sets in. For an exposure greater than or equal to 300 L the surface is entirely covered with amorphous Al2O3 (alpha-Al2O3) whereas the Co atoms seem to be unaffected. The EEL spectra of alpha-Al2O3 exhibit Fuchs-Kliewer modes at around 640 and 890 cm(-1). The thickness of the alpha-Al2O3 film is estimated to be 7.1 +/- 0.7 Angstrom. The STM images show that the oxide grows as large islands which cover the whole surface. The band gap of the ultra-thin alpha-Al2O3 film on CoAl(100) is found to be 3.2 eV and thus it is strongly diminished with respect to the bulk value. (C) 2003 Elsevier B.V. All rights reserved.

Keyword(s): J ; Auger electron spectroscopy (auto) ; low energy electron diffraction (LEED) (auto) ; electron energy loss spectroscopy (EELS) (auto) ; scanning tunneling microscopy (auto) ; oxidation (auto) ; cobalt (auto) ; aluminum (auto) ; aluminum oxide (auto) ; amorphous thin films (auto)

Note: Record converted from VDB: 12.11.2012

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Contributing Institute(s):

1. Institut für Grenzflächen und Vakuumtechnologien (ISG-3)

Research Program(s):

1. Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik (I01)

Appears in the scientific report 2003

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